Electron-Beam Exposure Epitaxy(EBE-epitaxy) for the Formation of SOI-GaAs Films on CaF2/Si(111) Structures
- Issue Date
- 1987
- Language
- ENG
- Citation
Extended Abstracts 19th Conf. on Solid State Devices and Materials, pp.581 - 584
- Appears in Collection
- EE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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