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Browse "College of Natural Sciences(자연과학대학)" by Author You, SJ

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Showing results 1 to 23 of 23

1	A Study on Characteristics of SF6/O2 Capacitive Discharge with QMS and Langmuir Probe Chang, Hong-Young; Lee, HS; Ahn, SK; You, SJ, AEPSE 2007, AEPSE, 2007
2	Computational comparative study of microwave probes for plasma density measurement Kim, Dae Woong; You, SJ; Kim, JH; Chang, Hongyoung; Oh, Wang-Yuhl, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.25, no.3, pp.035026, 2016-06
3	Control of electron density and temperature with a modified capacitive discharge You, SJ; Bai, KH; Chae, SH; Chang, Hong-Young, PLASMA CHEMISTRY AND PLASMA PROCESSING, v.25, pp.245 - 254, 2005-06
4	Control of electron temperature using grid bias voltage and its application to etching using fluorocarbon gases. Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, ESFC-13, ESFC, 2001
5	Control of negative ion density in SF6/Ar capacitive discharges You, SJ; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.12, pp.317 - 324, 2005-08
6	Driving frequency effect on electron heating mode transition in capacitive discharge You, SJ; Ahn, SK; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.89, pp.477 - 494, 2006-10
7	Driving frequency effect on the electron energy distribution function in capacitive discharge under constant discharge power condition Ahn, SK; You, SJ; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.89, pp.928 - 936, 2006-10
8	Effects of substrate bias voltage on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.9, pp.4246 - 4250, 2001-09
9	Electron and ion kinetics in magnetized capacitively coupled plasma source Lee, SH; You, SJ; Chang, Hong-Young; Lee, JK, JOURNAL OF VACUUM SCIENCE &AMP; TECHNOLOGY A, v.25, pp.455 - 463, 2007-05
10	Feature of electron energy distribution in a low-pressure capacitive discharge You, SJ; Chung, CW; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.87, pp.3751 - 3762, 2005-07
11	Low energy electron cooling induced by a magnetic field in high pressure capacitive radio frequency discharges You, SJ; Kim, SS; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.85, pp.4872 - 4874, 2004-11
12	Measurement and analysis of electron-neutral collision frequency in the calibrated cutoff probe You, KH; You, SJ; Kim, DW; Na, Byungkeun; Seo, BH; Kim, JH; Chang, Hongyoung, PHYSICS OF PLASMAS, v.23, no.3, pp.033509, 2016-03
13	Measurement of effective sheath width around the cutoff probe based on electromagnetic simulation Kim, Dae Woong; You, SJ; Kim, JH; Chang, Hongyoung; Yoon, JS; Oh, Wang-Yuhl, PHYSICS OF PLASMAS, v.23, no.5, pp.4945640, 2016-05
14	Measurement of electron density using reactance cutoff probe You, KH; You, SJ; Kim, Dae Woong; Na, Byungkeun; Seo, BH; Kim, JH; Seong, DJ; et al, PHYSICS OF PLASMAS, v.23, no.5, 2016-05
15	Mode transition for power dissipation induced by driving frequency in capacitively coupled plasma You, SJ; Kim, HC; Chung, CW; Chang, Hong-Young; Lee, JK, JOURNAL OF APPLIED PHYSICS, v.94, pp.7422 - 7426, 2003-12
16	Nonlocal to local transition of electron kinetic property in magnetized plasma You, SJ; Chang, Hong-Young, PHYSICS OF PLASMAS, v.13, pp.12722 - 12728, 2006-04
17	Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma You, SJ; Bai, KH; In, JH; Chang, Hong-Young; Choi, CK, SURFACE & COATINGS TECHNOLOGY, v.171, pp.226 - 230, 2003-07
18	Plasma parameters analysis of various mixed gas inductively coupled plasmas Bai, KH; You, SJ; Chang, Hong-Young; Uhm, HS, PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838, 2002-06
19	Power dissipation mode transition by a magnetic field You, SJ; Chung, CW; Bai, KH; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.81, no.14, pp.2529 - 2531, 2002-09
20	Role of transverse magnetic field in the capacitive discharge You, SJ; Hai, TT; Park, M; Kim, DW; Kim, JH; Seong, DJ; Shin, YH; et al, THIN SOLID FILMS, v.519, pp.6981 - 6989, 2011-08
21	Study on the mode transitions for rf power dissipation in capacitively coupled plasma You, SJ; Ahn, SK; Chang, Hong-Young, SURFACE & COATINGS TECHNOLOGY, v.193, pp.81 - 87, 2005-04
22	The Effect of pressure and gas species on Electron Cyclotron Resonance (ECR) in a weakly magnetized Inductively Coupled Plasma(ICP) Chung, W; Kim, SS; Lee, SW; You, SJ; Chang, Hong-Young, 54th Annual Gaseous Electronics Conference, 2001-10
23	The effects of mixing molecular gases on plasma parameters in a system with a grid-controlled electron temperature Bai, KH; Hong, JI; You, SJ; Choi, CK; Chang, Hong-Young, PHYSICS OF PLASMAS, v.9, no.3, pp.1025 - 1028, 2002-03

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