DSpace at KOASAS: Effects of PECVD Process Parameters on a Si:H Thin Films

DSpace at KOASAS

College of Engineering(공과대학)Dept. of Chemical and Biomolecular Engineering(생명화학공학과)CBE-Conference Papers(학술회의논문)

Effects of PECVD Process Parameters on a Si:H Thin Films

Cited 0 time in webofscience

Cited 0 time in scopus

Hit : 529
Download : 0

Export

Kim, JH / Woo, Seong-Ihl researcher / Kim, YT / Min, SK

Publisher: The Society of Physics

Issue Date: 1988

Language: ENG

Citation: The Society of Physics Fall Symposium

URI: http://hdl.handle.net/10203/105769

Appears in Collection: CBE-Conference Papers(학술회의논문)

Files in This Item: There are no files associated with this item.

Display Full Item Record

qr_code

트윗하기

KOASAS

Knowledge Service Development Team, KAIST 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea. T. 82-42-350-4493 Email. koasas@kaist.ac.kr
Copyright © 2016. Korea Advanced Institute of Science and Technology. All Rights Reserved.

KOASAS

KOASAS

Browse

Effects of PECVD Process Parameters on a Si:H Thin Films

KOASAS

Communities & Collections