DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, JH | - |
dc.contributor.author | Woo, Seong-Ihl | - |
dc.contributor.author | Kim, YT | - |
dc.contributor.author | Min, SK | - |
dc.date.accessioned | 2013-03-14T05:39:54Z | - |
dc.date.available | 2013-03-14T05:39:54Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1988 | - |
dc.identifier.citation | The Society of Physics Fall Symposium, v., no., pp. - | - |
dc.identifier.uri | http://hdl.handle.net/10203/105769 | - |
dc.language | ENG | - |
dc.publisher | The Society of Physics | - |
dc.title | Effects of PECVD Process Parameters on a Si:H Thin Films | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | The Society of Physics Fall Symposium | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Woo, Seong-Ihl | - |
dc.contributor.nonIdAuthor | Kim, JH | - |
dc.contributor.nonIdAuthor | Kim, YT | - |
dc.contributor.nonIdAuthor | Min, SK | - |
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