ATOMIC LAYER DEPOSITION; CHEMICAL-VAPOR-DEPOSITION; OXIDE THIN-FILMS; DIAMIDO-PYRIDINE LIGANDS; HIGH THERMAL-STABILITY; METAL NITRIDE FILMS; HYDRODENITROGENATION CATALYSIS; DIELECTRIC APPLICATIONS; ORGANOIMIDO COMPLEXES; ALKYLAMIDE PRECURSORS
ORGANOMETALLICS, v.31, no.23, pp.8109 - 8113
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