DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Bo-Keun | ko |
dc.contributor.author | Kim, Hyo-Suk | ko |
dc.contributor.author | Shin, Su-Jung | ko |
dc.contributor.author | Min, Jae-Ki | ko |
dc.contributor.author | Lee, Kang-Mun | ko |
dc.contributor.author | Do, Young-Kyu | ko |
dc.contributor.author | Kim, Chang-Gyoun | ko |
dc.contributor.author | Chung, Taek-Mo | ko |
dc.date.accessioned | 2013-03-12T16:33:17Z | - |
dc.date.available | 2013-03-12T16:33:17Z | - |
dc.date.created | 2013-01-07 | - |
dc.date.created | 2013-01-07 | - |
dc.date.issued | 2012-12 | - |
dc.identifier.citation | ORGANOMETALLICS, v.31, no.23, pp.8109 - 8113 | - |
dc.identifier.issn | 0276-7333 | - |
dc.identifier.uri | http://hdl.handle.net/10203/102879 | - |
dc.description.abstract | A novel Ta(V) Bu-t-imido/aminoalkoxide complex, Ta((NBu)-Bu-t)(dmamp)(2)Cl (1), was synthesized by metathesis reaction between Ta((NBu)-Bu-t)Cl-3(py)(2) and 2 equiv of Na-(dmamp), and subsequent reaction of 1 with 1 equiv of MeLi gave a new tantalum complex, Ta((NBu)-Bu-t)(dmamp)(2)Me (2). Compounds 1 and 2 have been characterized by IR, H-1 and C-13 NMR spectroscopy, and microanalytical data. The molecular structure of 1, determined by X-ray single crystallography, revealed distorted octahedral geometry. The behavior of compound 1 in solution was studied by variable-temperature H-1 NMR spectra. Thermogravimetric analysis revealed superior thermal properties of 2 as compared to those of 1. | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | ATOMIC LAYER DEPOSITION | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | OXIDE THIN-FILMS | - |
dc.subject | DIAMIDO-PYRIDINE LIGANDS | - |
dc.subject | HIGH THERMAL-STABILITY | - |
dc.subject | METAL NITRIDE FILMS | - |
dc.subject | HYDRODENITROGENATION CATALYSIS | - |
dc.subject | DIELECTRIC APPLICATIONS | - |
dc.subject | ORGANOIMIDO COMPLEXES | - |
dc.subject | ALKYLAMIDE PRECURSORS | - |
dc.title | Synthessis and Characterization of Novel Volatile Imido-Aminoalkoxide Tantalum Compounds | - |
dc.type | Article | - |
dc.identifier.wosid | 000312035500014 | - |
dc.identifier.scopusid | 2-s2.0-84870865822 | - |
dc.type.rims | ART | - |
dc.citation.volume | 31 | - |
dc.citation.issue | 23 | - |
dc.citation.beginningpage | 8109 | - |
dc.citation.endingpage | 8113 | - |
dc.citation.publicationname | ORGANOMETALLICS | - |
dc.identifier.doi | 10.1021/om300436p | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Do, Young-Kyu | - |
dc.contributor.nonIdAuthor | Park, Bo-Keun | - |
dc.contributor.nonIdAuthor | Kim, Hyo-Suk | - |
dc.contributor.nonIdAuthor | Shin, Su-Jung | - |
dc.contributor.nonIdAuthor | Min, Jae-Ki | - |
dc.contributor.nonIdAuthor | Kim, Chang-Gyoun | - |
dc.contributor.nonIdAuthor | Chung, Taek-Mo | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | ATOMIC LAYER DEPOSITION | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | OXIDE THIN-FILMS | - |
dc.subject.keywordPlus | DIAMIDO-PYRIDINE LIGANDS | - |
dc.subject.keywordPlus | HIGH THERMAL-STABILITY | - |
dc.subject.keywordPlus | METAL NITRIDE FILMS | - |
dc.subject.keywordPlus | HYDRODENITROGENATION CATALYSIS | - |
dc.subject.keywordPlus | DIELECTRIC APPLICATIONS | - |
dc.subject.keywordPlus | ORGANOIMIDO COMPLEXES | - |
dc.subject.keywordPlus | ALKYLAMIDE PRECURSORS | - |
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