Relationship between domain structure and film thickness in epitaxial PbTiO3 films deposited on Mg(001) by reactive sputtering

Abstract

The epitaxial PbTiO3 thin films of different thickness were prepared on MgO(001) substrates by the reactive direct-current magnetron sputtering. The volume fraction of c domains, alpha, which was measured by x-ray diffractometry, increased rapidly from zero with the film thickness, being saturated at about 90% above 100 nm. The films were annealed in a PbO atmosphere at 700 degrees C for 8 h, and they were used to study the composition change in the Pb/(Pb + Ti) ratio and the relaxation of the residual intrinsic stress. The relationship between change of alpha and composition was weak. The stress state was calculated through the finite-element method. As for the small thickness, the tensile epitaxial stress overwhelmed compressive intrinsic and thermal stresses, and the domain structure was a-domain oriented. As for the large thickness, the compressive intrinsic stress together with the thermal stress overcame the tensile epitaxial stress, and the population turned into c domain.