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A study of the oxidation behavior and the postannealing effect in a graded SiGe/Si heterostructure Lim, YS; Jeong, JS; Lee, JeongYong; Kim, HS; Shon, HK; Kim, HK; Moon, DW, JOURNAL OF ELECTRONIC MATERIALS, v.31, no.5, pp.529 - 534, 2002-05 |
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