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Effect of acid structure on deprotection of poly(2-trimethylsilyl-2-propyl methacrylate) Kim, Jin-Baek; Kim, H, POLYMER, v.40, no.14, pp.4055 - 4061, 1999-06 |
Poly (2-trimethylsilyl-2-propyl methacrylate-co-gamma-butyrolactone-2-yl methacrylate) for ArF lithography Kim, Jin-Baek; Kim, H; Lee, SH; Moon, JT, POLYMER, v.40, no.18, pp.5213 - 5217, 1999-08 |
Poly(5-((2-trimethylsilyl-2-propyl)oxycarbonyl)-norbornene-co-maleic anhydride) for 193-nm lithography Kim, Jin-Baek; Lee, JJ; Kang, JS, POLYMER, v.41, no.18, pp.6939 - 6942, 2000-08 |
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