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ArF laser lithography 용 위상 변위 막을 위한 Transition metal (Hf, Zr) oxide, oxynitride 박막의 전자 상태 및 광학 특성 분석 = The electronic structures and optical properties of transition metal (Hf, Zr) oxide and oxynitride thin films as phase shift mask for ArF laser lithographylink 김성관; Kim, Sung-Kwan; et al, 한국과학기술원, 2006 |
The electronic structures for the optical absorption of Hf-O-N thin films Kim, Sung Kwan; Kim, Yang-Soo; Jeon, Young-Ah; Choi, Jongwan; No, Kwangsoo, JOURNAL OF ELECTROCERAMICS, v.17, no.2-4, pp.197 - 203, 2006-12 |
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