Effect of the target power density on the synthesis and physical properties of sputtered nc-C films

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Hydrogen-free nanostructured carbon (nc-C) films were synthesized at various graphite target power densities using a closed field unbalanced magnetron sputtering system (CFUBM). The power density of each graphite target was varied from 10 to 30 W/cm(2) in Ar gas atmosphere with a fixed pressure of 0.4 Pa and a substrate bias voltage of -200 V. The aim of this study was to determine the relationship between the microstructure and physical properties of ne-C films as a function of the target power density. The film structures were examined by Raman spectroscopy, X-ray photoelectron spectroscopy and field emission scanning electron microscopy. The physical properties of the nc-C films were evaluated using a nano-indentation tester, a 4-point probe and a residual stress tester. The number of graphitic nano-cluster increased with increasing target power density and a good conductive nanostructured carbon film was obtained. The nc-C film deposited at a target power density of 30 W/cm(2) exhibited the minimum electrical resistivity. (c) 2005 Elsevier B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE SA
Issue Date
2006-01
Language
English
Article Type
Article; Proceedings Paper
Keywords

DIAMOND-LIKE CARBON; A-C; H FILMS; PRESSURE

Citation

THIN SOLID FILMS, v.494, pp.123 - 127

ISSN
0040-6090
DOI
10.1016/j.tsf.2005.07.170
URI
http://hdl.handle.net/10203/86707
Appears in Collection
MS-Journal Papers(저널논문)
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