Role of As Atoms Absorbed on the Uppermose CaF2 Surface in the Electron-Beam exposure and Epitaxy for GaAs/CaF2/Si Structures
- Issue Date
- 1989
- Language
- ENG
- Citation
Proc. 20th Symp. on lon Implantation and Submicron Fabrication, Saitama Japan, pp.9 - 12
- Appears in Collection
- EE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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