Optically tunable arrayed structures for highly sensitive plasmonic detection via simplified holographic lithography

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Hexagonally arranged plasmonic dot arrays were fabricated using simplified holographic lithography, electron-beam evaporation and lift-off processes. In our strategy, we used face-centered cubic structures as metal deposition masks which were created by prism holographic lithography. The features of plasmonic dot arrays such as arrangements, shapes, and sizes depended on the number of face-centered cubic structure layers and the laser exposure dose. The arrays showed tunable optical properties and were useful for surface-enhanced Raman scattering.
Publisher
ROYAL SOC CHEMISTRY
Issue Date
2012-01
Language
English
Article Type
Article
Keywords

MULTIBEAM INTERFERENCE LITHOGRAPHY; ENHANCED RAMAN-SCATTERING; PHOTONIC CRYSTALS; FABRICATION; ELECTRODEPOSITION

Citation

JOURNAL OF MATERIALS CHEMISTRY, v.22, no.11, pp.4603 - 4606

ISSN
0959-9428
DOI
10.1039/c2jm15723c
URI
http://hdl.handle.net/10203/99980
Appears in Collection
CBE-Journal Papers(저널논문)
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