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Fabrication of 50 nm trigate silicon on insulator metal-oxide-silicon field-effect transistor without source/drain activation annealing

Im, Kiju; Cho, Won-Ju; Ahn, Chang-Geun; Yang, Jong-Heon; Oh, Jihun; Lee, Seongjae; Hwang, Hyunsang, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, v.43, no.5A, pp.2438 - 2441, 2004-05

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