High-Purity Ultraviolet Electroluminescence from n-ZnO Nanowires/p(+)-Si Heterostructure LEDs with i-MgO Film as Carrier Control Layer

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Pure ultraviolet (UV) light emitting diodes (LEDs) using n-ZnO nanowires as an active layer were fabricated with an insulating MgO dielectric layer as a carrier control layer, where all depositions were continuously performed by metalorganic chemical vapor deposition. The current-voltage curve of the LEDs showed obvious rectifying characteristics, with a threshold voltage of about 7 V in the sample with 4 nm i-MgO. Under the forward bias of the samples with proper MgO thickness, a sharp UV electroluminescence, located at around 380 nm, was emitted from the active ZnO nanowires, while weak visible emission of around 450-700 nm were observed. The pure UV emission from the ZnO nanowires in the n-ZnO/i-MgO/p(+)-Si heterostructures was attributed to the electron accumulation in the ZnO by asymmetric band offset and preemptive hole tunneling from Si to ZnO by i-MgO. (C) 2011 The Electrochemical Society. [DOI: 10.1149/2.029202jes] All rights reserved.
Publisher
ELECTROCHEMICAL SOC INC
Issue Date
2012
Language
English
Article Type
Article
Keywords

LIGHT-EMITTING-DIODES; CHEMICAL-VAPOR-DEPOSITION; FABRICATION

Citation

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.159, no.2, pp.102 - 106

ISSN
0013-4651
DOI
10.1149/2.029202jes
URI
http://hdl.handle.net/10203/97408
Appears in Collection
MS-Journal Papers(저널논문)
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