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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Journal Papers(저널논문)

Antireflection Behavior of Multidimensional Nanostructures Patterned Using a Conformable Elastomeric Phase Mask in a Single Exposure Step

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dc.contributor.authorPark, Junyongko
dc.contributor.authorYoon, Sanghoonko
dc.contributor.authorKang, Kisukko
dc.contributor.authorJeon, Seokwooko
dc.date.accessioned2013-03-09T15:30:56Z-
dc.date.available2013-03-09T15:30:56Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2010-09-
dc.identifier.citationSMALL, v.6, no.18, pp.1981 - 1985-
dc.identifier.issn1613-6810-
dc.identifier.urihttp://hdl.handle.net/10203/96734-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectINFRARED SPECTRAL REGION-
dc.subjectSTRUCTURED SURFACES-
dc.subjectBROAD-BAND-
dc.subjectOPTOELECTRONIC DEVICES-
dc.subjectSOFT LITHOGRAPHY-
dc.subjectSOLAR-CELLS-
dc.subjectTHIN-FILMS-
dc.subjectCOATINGS-
dc.subjectGLASS-
dc.subjectREFLECTION-
dc.titleAntireflection Behavior of Multidimensional Nanostructures Patterned Using a Conformable Elastomeric Phase Mask in a Single Exposure Step-
dc.typeArticle-
dc.identifier.wosid000282664800004-
dc.identifier.scopusid2-s2.0-77956910216-
dc.type.rimsART-
dc.citation.volume6-
dc.citation.issue18-
dc.citation.beginningpage1981-
dc.citation.endingpage1985-
dc.citation.publicationnameSMALL-
dc.identifier.doi10.1002/smll.201000275-
dc.contributor.localauthorKang, Kisuk-
dc.contributor.localauthorJeon, Seokwoo-
dc.contributor.nonIdAuthorPark, Junyong-
dc.contributor.nonIdAuthorYoon, Sanghoon-
dc.type.journalArticleArticle-
dc.subject.keywordPlusINFRARED SPECTRAL REGION-
dc.subject.keywordPlusSTRUCTURED SURFACES-
dc.subject.keywordPlusBROAD-BAND-
dc.subject.keywordPlusOPTOELECTRONIC DEVICES-
dc.subject.keywordPlusSOFT LITHOGRAPHY-
dc.subject.keywordPlusSOLAR-CELLS-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusCOATINGS-
dc.subject.keywordPlusGLASS-
dc.subject.keywordPlusREFLECTION-
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MS-Journal Papers(저널논문)
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