Phase separation and microstructure of BaTiO3-CoFe2O4 epitaxial nanocomposite films deposited under low working pressure

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dc.contributor.authorKim, Kyoung-Sunko
dc.contributor.authorHan, Seung-Hoko
dc.contributor.authorKim, Ho-Giko
dc.contributor.authorKim, Jeong-Seogko
dc.contributor.authorCheon, Chae-Ilko
dc.date.accessioned2013-03-09T08:56:20Z-
dc.date.available2013-03-09T08:56:20Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2010-07-
dc.identifier.citationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.28, no.4, pp.C5A14 - C5A19-
dc.identifier.issn1071-1023-
dc.identifier.urihttp://hdl.handle.net/10203/95929-
dc.description.abstract0.6 BaTiO3-0.4CoFe(2)O(4) (BTO-CFO) composite thin films were deposited under various working pressures on SrTiO3 (100) substrates by pulsed laser deposition. The phase separation and the microstructure of the composite film were investigated by x-ray diffraction, scanning electron microscopy, high resolution transmission electron microscopy, and energy dispersive x-ray spectroscopy. The separation of the BTO and CFO phases started at a lower substrate temperature and full width at half maximum values for BTO and CFO were smaller in the heteroepitaxial composite film deposited under a low working pressure of 0.1 mTorr than the composite film deposited under 100 mTorr. The BTO-CFO heteroepitaxial nanocomposite film exhibited a typical 1-3 nanostructure, rectangular-shaped CFO nanopillars with a lateral size of 20-50 nm embedded in the continuous BTO matrix phase, when deposited at 750 degrees C under 0.1 mTorr. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3429597]-
dc.languageEnglish-
dc.publisherA V S Amer Inst Physics-
dc.subjectPULSED-LASER DEPOSITION-
dc.subjectNANOSTRUCTURES-
dc.titlePhase separation and microstructure of BaTiO3-CoFe2O4 epitaxial nanocomposite films deposited under low working pressure-
dc.typeArticle-
dc.identifier.wosid000281019500044-
dc.identifier.scopusid2-s2.0-77957230554-
dc.type.rimsART-
dc.citation.volume28-
dc.citation.issue4-
dc.citation.beginningpageC5A14-
dc.citation.endingpageC5A19-
dc.citation.publicationnameJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.contributor.localauthorKim, Ho-Gi-
dc.contributor.nonIdAuthorKim, Jeong-Seog-
dc.contributor.nonIdAuthorCheon, Chae-Il-
dc.type.journalArticleArticle; Proceedings Paper-
dc.subject.keywordPlusPULSED-LASER DEPOSITION-
dc.subject.keywordPlusNANOSTRUCTURES-
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