Mussel-Inspired Block Copolymer Lithography for Low Surface Energy Materials of Teflon, Graphene, and Gold

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dc.contributor.authorKim, Bong-Hoonko
dc.contributor.authorLee, Duck-Hyunko
dc.contributor.authorKim, Ju-Youngko
dc.contributor.authorShin, Dong-Okko
dc.contributor.authorJeong, Hu-Youngko
dc.contributor.authorHong, Seon-Kiko
dc.contributor.authorYun, Je-Moonko
dc.contributor.authorKoo, Chong-Minko
dc.contributor.authorLee, Hae-Shinko
dc.contributor.authorKim, Sang-Oukko
dc.date.accessioned2013-03-09T07:07:57Z-
dc.date.available2013-03-09T07:07:57Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2011-12-
dc.identifier.citationADVANCED MATERIALS, v.23, no.47, pp.5618 - 5618-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10203/95676-
dc.description.abstractMussel-inspired interfacial engineering is synergistically integrated with block copolymer (BCP) lithography for the surface nanopatterning of low surface energy substrate materials, including, Teflon, graphene, and gold. The image shows the Teflon nanowires and their excellent superhydrophobicity.-
dc.languageEnglish-
dc.publisherWILEY-BLACKWELL-
dc.subjectSOFT GRAPHOEPITAXY-
dc.subjectCUTICULAR WAXES-
dc.subjectLARGE-AREA-
dc.subjectPHOTORESIST-
dc.subjectFILMS-
dc.subjectFABRICATION-
dc.subjectPOLYMERS-
dc.subjectCUTICLE-
dc.subjectARRAYS-
dc.titleMussel-Inspired Block Copolymer Lithography for Low Surface Energy Materials of Teflon, Graphene, and Gold-
dc.typeArticle-
dc.identifier.wosid000297788600003-
dc.identifier.scopusid2-s2.0-83455200080-
dc.type.rimsART-
dc.citation.volume23-
dc.citation.issue47-
dc.citation.beginningpage5618-
dc.citation.endingpage5618-
dc.citation.publicationnameADVANCED MATERIALS-
dc.contributor.localauthorLee, Hae-Shin-
dc.contributor.localauthorKim, Sang-Ouk-
dc.contributor.nonIdAuthorLee, Duck-Hyun-
dc.contributor.nonIdAuthorKim, Ju-Young-
dc.contributor.nonIdAuthorJeong, Hu-Young-
dc.contributor.nonIdAuthorHong, Seon-Ki-
dc.contributor.nonIdAuthorYun, Je-Moon-
dc.contributor.nonIdAuthorKoo, Chong-Min-
dc.type.journalArticleArticle-
dc.subject.keywordAuthoradhesives-
dc.subject.keywordAuthorsurface energy-
dc.subject.keywordAuthorblock copolymers-
dc.subject.keywordAuthornanopatterning-
dc.subject.keywordAuthorgraphene-
dc.subject.keywordPlusSOFT GRAPHOEPITAXY-
dc.subject.keywordPlusCUTICULAR WAXES-
dc.subject.keywordPlusLARGE-AREA-
dc.subject.keywordPlusPHOTORESIST-
dc.subject.keywordPlusFILMS-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusPOLYMERS-
dc.subject.keywordPlusCUTICLE-
dc.subject.keywordPlusARRAYS-
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