DC Field | Value | Language |
---|---|---|
dc.contributor.author | 이승렬 | ko |
dc.contributor.author | 안병태 | ko |
dc.contributor.author | 김선일 | ko |
dc.date.accessioned | 2009-06-18T01:54:12Z | - |
dc.date.available | 2009-06-18T01:54:12Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2006-01 | - |
dc.identifier.citation | 한국재료학회지, v.16, no.1, pp.30 - 36 | - |
dc.identifier.issn | 1225-0562 | - |
dc.identifier.uri | http://hdl.handle.net/10203/9550 | - |
dc.description.abstract | A novel method was proposed to grow an epitaxial on (100)Si substrate. A interlayer was deposited by reactive sputtering of Co in an Ar+ flow. From the Ti/Co//Si structure, a uniform and thin layer was epitaxially grown on (100)Si by annealing above . Two amorphous layers were found at the /Si interface, where the top layer has a silicon nitride (Si-N) bonding state with some Co content and the bottom layer has a Co-Si intermixing state. The SiNx amorphous layer seems to play a critical role of suppressing the diffusion of Co into Si substrate for the direct formation of epitaxial . | - |
dc.language | Korean | - |
dc.language.iso | ko | en |
dc.publisher | 한국재료학회 | - |
dc.title | 반응성 스퍼터링법으로 증착된 CoNx 중간층을 이용한 (100)Si 기판 위에서의 에피택셜 CoSi2 성장 연구 | - |
dc.title.alternative | Epitaxial Growth of CoSi2 Layer on (100)Si Substrate using CoNx Interlayer deposited by Reactive Sputtering | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.citation.volume | 16 | - |
dc.citation.issue | 1 | - |
dc.citation.beginningpage | 30 | - |
dc.citation.endingpage | 36 | - |
dc.citation.publicationname | 한국재료학회지 | - |
dc.identifier.kciid | ART000987313 | - |
dc.contributor.localauthor | 안병태 | - |
dc.contributor.nonIdAuthor | 이승렬 | - |
dc.contributor.nonIdAuthor | 김선일 | - |
dc.subject.keywordAuthor | Epitaxial CoSi2 | - |
dc.subject.keywordAuthor | Reactive Sputtering | - |
dc.subject.keywordAuthor | CoNx interlayer | - |
dc.subject.keywordAuthor | SiNx interface layer | - |
dc.subject.keywordAuthor | Epitaxial CoSi2 | - |
dc.subject.keywordAuthor | Reactive Sputtering | - |
dc.subject.keywordAuthor | CoNx interlayer | - |
dc.subject.keywordAuthor | SiNx interface layer | - |
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