Designed Workfunction Engineering of Double-Stacked Metal Nanocrystals for Nonvolatile Memory Application

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dc.contributor.authorRyu, Seong-Wanko
dc.contributor.authorLee, Jong-Wonko
dc.contributor.authorHan, Jin-Wooko
dc.contributor.authorKim, Sung-Hoko
dc.contributor.authorChoi, Yang-Kyuko
dc.date.accessioned2013-03-09T03:03:58Z-
dc.date.available2013-03-09T03:03:58Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2009-03-
dc.identifier.citationIEEE TRANSACTIONS ON ELECTRON DEVICES, v.56, no.3, pp.377 - 382-
dc.identifier.issn0018-9383-
dc.identifier.urihttp://hdl.handle.net/10203/95202-
dc.description.abstractA double-stacked nanocrystal (DSNC) Hash memory is presented for improvement of both program/erase speed and data retention time. Four combinations of nickel (Ni) and gold (An) (Ni/Ni, Au/Au, Ni/Au, and Au/Ni) are used as charge storage DSNC materials and are compared from the perspective of memory performance, Through experimental results for P/E efficiency and retention time, the optimized energy band lineup for faster P/E, and longer charge retention is presented. A combination of a deep potential well at the top and a shallow potential well at the bottom exhibits optimized performance in P/E, and this combination also shows the longest data retention characteristics.-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.subjectRETENTION-
dc.subjectDEVICES-
dc.subjectOXIDE-
dc.subjectGATE-
dc.titleDesigned Workfunction Engineering of Double-Stacked Metal Nanocrystals for Nonvolatile Memory Application-
dc.typeArticle-
dc.identifier.wosid000264019300004-
dc.identifier.scopusid2-s2.0-62749140701-
dc.type.rimsART-
dc.citation.volume56-
dc.citation.issue3-
dc.citation.beginningpage377-
dc.citation.endingpage382-
dc.citation.publicationnameIEEE TRANSACTIONS ON ELECTRON DEVICES-
dc.identifier.doi10.1109/TED.2008.2011677-
dc.contributor.localauthorChoi, Yang-Kyu-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorAu and Ni-
dc.subject.keywordAuthordouble-stacked nanocrystal (DSNC)-
dc.subject.keywordAuthorenergy band lineup-
dc.subject.keywordAuthorflash memory-
dc.subject.keywordAuthornanocrystal (NC)-
dc.subject.keywordAuthornanocrystal floating-gate memory (NFGM)-
dc.subject.keywordAuthornonvolatile memory (NVM)-
dc.subject.keywordAuthorprogram/erase (P/E) speed-
dc.subject.keywordAuthorretention time-
dc.subject.keywordPlusRETENTION-
dc.subject.keywordPlusDEVICES-
dc.subject.keywordPlusOXIDE-
dc.subject.keywordPlusGATE-
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