Effects of hydroxyl groups in gate dielectrics on the hysteresis of organic thin film transistors

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dc.contributor.authorChoi, Chaun Giko
dc.contributor.authorBae, Byeong-Sooko
dc.date.accessioned2009-06-15T08:55:22Z-
dc.date.available2009-06-15T08:55:22Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2007-
dc.identifier.citationELECTROCHEMICAL AND SOLID STATE LETTERS, v.10, no.11, pp.H347 - H350-
dc.identifier.issn1099-0062-
dc.identifier.urihttp://hdl.handle.net/10203/9428-
dc.description.abstractThe position of hydroxyl groups in organic-inorganic hybrid gate dielectrics was varied by altering the processing conditions and its effect on the organic thin film transistor (OTFT) was investigated. Although the hysteresis in OTFTs depends on both the hydroxyl groups on the surface and in the bulk of the gate dielectric, the hydroxyl groups on the surface had a greater effect on the OTFT performance. The reduced hysteresis was achieved by the elimination of the hydroxyl groups on the surface by hexamethyldisilazane surface treatment. (c) 2007 The Electrochemical Society. All rights reserved.-
dc.description.sponsorshipThis work was supported by the Korea Science and Engineering Foundation KOSEF grant funded by the Korean government MOST no. R01-2003-000-10125-0. B.S.B. acknowledges the financial support of the LG Yonam Foundation for making his visit to the Flexible Display Center at ASU possible.en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherElectrochemical Soc Inc-
dc.subjectHYBRID MATERIAL-
dc.subjectSEMICONDUCTORS-
dc.subjectFABRICATION-
dc.subjectDISPLAYS-
dc.subjectBEHAVIOR-
dc.titleEffects of hydroxyl groups in gate dielectrics on the hysteresis of organic thin film transistors-
dc.typeArticle-
dc.identifier.wosid000249323200027-
dc.identifier.scopusid2-s2.0-34548506219-
dc.type.rimsART-
dc.citation.volume10-
dc.citation.issue11-
dc.citation.beginningpageH347-
dc.citation.endingpageH350-
dc.citation.publicationnameELECTROCHEMICAL AND SOLID STATE LETTERS-
dc.identifier.doi10.1149/1.2779946-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorBae, Byeong-Soo-
dc.contributor.nonIdAuthorChoi, Chaun Gi-
dc.type.journalArticleArticle-
dc.subject.keywordPlusHYBRID MATERIAL-
dc.subject.keywordPlusSEMICONDUCTORS-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusDISPLAYS-
dc.subject.keywordPlusBEHAVIOR-
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