A Feasibility Study of Nano-grained ZnO Piezoelectric Thin Film Fabrication

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dc.contributor.authorRuirui Zhangko
dc.contributor.authorLee, Eunjuko
dc.contributor.author윤기완ko
dc.date.accessioned2013-03-08T15:30:47Z-
dc.date.available2013-03-08T15:30:47Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2009-12-
dc.identifier.citationJOURNAL OF INFORMATION AND COMMUNICATION CONVERGENCE ENGINEERING, v.7, no.4, pp.530 - 534-
dc.identifier.issn1738-0235-
dc.identifier.urihttp://hdl.handle.net/10203/93420-
dc.description.abstractC-axis-oriented ZnO thin films were successfully deposited on p-Si (100) in an RF magnetron sputtering system. Deposition conditions such as deposition power, working pressure, and oxygen gas ratio were varied. Crystalline structures of the deposited ZnO films were investigated by a scanning electron microscope (SEM) technique. Results show that the deposition parameters can have a strong impact on the preferred orientations and grain sizes of the deposited ZnO films.-
dc.languageKorean-
dc.publisher한국정보통신학회-
dc.titleA Feasibility Study of Nano-grained ZnO Piezoelectric Thin Film Fabrication-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume7-
dc.citation.issue4-
dc.citation.beginningpage530-
dc.citation.endingpage534-
dc.citation.publicationnameJOURNAL OF INFORMATION AND COMMUNICATION CONVERGENCE ENGINEERING-
dc.identifier.kciidART001406740-
dc.contributor.localauthor윤기완-
dc.contributor.nonIdAuthorRuirui Zhang-
dc.subject.keywordAuthorC-axis orientation-
dc.subject.keywordAuthorGrain size-
dc.subject.keywordAuthorRF Magnetron sputtering-
dc.subject.keywordAuthorZnO thin film.-
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EE-Journal Papers(저널논문)
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