DC Field | Value | Language |
---|---|---|
dc.contributor.author | Pham, Tuan Anh | ko |
dc.contributor.author | Kim, Pilnam | ko |
dc.contributor.author | Kwak, Moonkyoo | ko |
dc.contributor.author | Suh, Kahp Y. | ko |
dc.contributor.author | Kim, Dong-Pyo | ko |
dc.date.accessioned | 2013-03-08T12:55:44Z | - |
dc.date.available | 2013-03-08T12:55:44Z | - |
dc.date.created | 2012-07-13 | - |
dc.date.created | 2012-07-13 | - |
dc.date.issued | 2007 | - |
dc.identifier.citation | CHEMICAL COMMUNICATIONS, no.39, pp.4021 - 4023 | - |
dc.identifier.issn | 1359-7345 | - |
dc.identifier.uri | http://hdl.handle.net/10203/93061 | - |
dc.description.abstract | A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C. | - |
dc.language | English | - |
dc.publisher | ROYAL SOC CHEMISTRY | - |
dc.subject | SICN MEMS | - |
dc.subject | FABRICATION | - |
dc.subject | MICROSTRUCTURES | - |
dc.subject | COMPOSITES | - |
dc.title | Inorganic polymer photoresist for direct ceramic patterning by photolithography | - |
dc.type | Article | - |
dc.identifier.wosid | 000249925400020 | - |
dc.identifier.scopusid | 2-s2.0-34948853244 | - |
dc.type.rims | ART | - |
dc.citation.issue | 39 | - |
dc.citation.beginningpage | 4021 | - |
dc.citation.endingpage | 4023 | - |
dc.citation.publicationname | CHEMICAL COMMUNICATIONS | - |
dc.identifier.doi | 10.1039/b708480c | - |
dc.contributor.localauthor | Kim, Pilnam | - |
dc.contributor.nonIdAuthor | Pham, Tuan Anh | - |
dc.contributor.nonIdAuthor | Kwak, Moonkyoo | - |
dc.contributor.nonIdAuthor | Suh, Kahp Y. | - |
dc.contributor.nonIdAuthor | Kim, Dong-Pyo | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | SICN MEMS | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | MICROSTRUCTURES | - |
dc.subject.keywordPlus | COMPOSITES | - |
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