DC Field | Value | Language |
---|---|---|
dc.contributor.author | 조선희 | ko |
dc.contributor.author | 이원종 | ko |
dc.date.accessioned | 2013-03-08T11:49:58Z | - |
dc.date.available | 2013-03-08T11:49:58Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2006-12 | - |
dc.identifier.citation | 전기전자재료학회논문지, v.19, no.12, pp.1078 - 1084 | - |
dc.identifier.issn | 1226-7945 | - |
dc.identifier.uri | http://hdl.handle.net/10203/92940 | - |
dc.description.abstract | Impurity contamination induced by $CF_4\;and\;HBr/Cl_2/O2 plasma etching on Si surface was examined by using surface spectroscopes. XPS(x-ray photoelectron spectroscopy) surface analysis showed that F of 0.4 at % exists in the surface layer in the form of Si-F bonding but Br and Cl are below the detection limit $(0.1{\sim}1.0%)$ of the spectroscope. Static-SIMS(secondary ion mass spectrometry) surface analysis showed that the etched Si surface was contaminated with etching gas elements such as H, F, Cl and Br, and they existed to the depth of about $20{\sim}40nm$. The etched Si surface was treated with three different methods that were HF dip, thermal oxidation followed by HF dip and oxygen-plasma oxidation followed by HF dip. They showed an effect in reducing the impurity contamination and the oxygen-plasma oxidation followed by HF dipping method appears to be a little bit more effective. | - |
dc.language | Korean | - |
dc.publisher | 한국전기전자재료학회 | - |
dc.title | 플라즈마 식각에 의하여 실리콘 표면에 유기된 불순물 오염의 분석 및 제거 | - |
dc.title.alternative | Analysis and Reduction of Impurity Contamination Induced by Plasma Etching on Si Surface | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.citation.volume | 19 | - |
dc.citation.issue | 12 | - |
dc.citation.beginningpage | 1078 | - |
dc.citation.endingpage | 1084 | - |
dc.citation.publicationname | 전기전자재료학회논문지 | - |
dc.identifier.kciid | ART001089629 | - |
dc.contributor.localauthor | 이원종 | - |
dc.contributor.nonIdAuthor | 조선희 | - |
dc.subject.keywordAuthor | Plasma etching | - |
dc.subject.keywordAuthor | Impurity contamination | - |
dc.subject.keywordAuthor | Post-treatment | - |
dc.subject.keywordAuthor | Static-SIMS | - |
dc.subject.keywordAuthor | Plasma etching | - |
dc.subject.keywordAuthor | Impurity contamination | - |
dc.subject.keywordAuthor | Post-treatment | - |
dc.subject.keywordAuthor | Static-SIMS | - |
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