Iterative learning control applied to batch processes: An overview

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dc.contributor.authorLee, JayHyungko
dc.contributor.authorLee, Kwang S.ko
dc.date.accessioned2013-03-08T10:33:37Z-
dc.date.available2013-03-08T10:33:37Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2007-10-
dc.identifier.citationCONTROL ENGINEERING PRACTICE, v.15, no.10, pp.1306 - 1318-
dc.identifier.issn0967-0661-
dc.identifier.urihttp://hdl.handle.net/10203/92842-
dc.description.abstractWith the recent emphasis on batch processing by emerging industries like the microelectronics and biotechnology, the interest in batch process control has been renewed. This paper gives an overview of the iterative learning control (ILC) technique, which can be used to improve tracking control performance in batch processes. The fundamental concepts and review of the various ILC algorithms are presented, with a particular focus on a model-based algorithm called Q-ILC and an application involving a rapid thermal processing (RTP) system. The study indicates that one can solve a seemingly very difficult multivariable nonlinear tracking problem with relative case by intelligently combining the ILC technique with basic process insights and standard system identification techniques. Some related techniques in the literature are brought forth with the hope of unifying them. We aslo suggest some remaining challenges. (c) 2007 Elsevier Ltd. All rights reserved.-
dc.languageEnglish-
dc.publisherPERGAMON-ELSEVIER SCIENCE LTD-
dc.subjectMODEL-PREDICTIVE CONTROL-
dc.subjectWAFER TEMPERATURE UNIFORMITY-
dc.subjectREPETITIVE CONTROL-
dc.subjectSYSTEM-
dc.subjectCONVERGENCE-
dc.subjectALGORITHM-
dc.titleIterative learning control applied to batch processes: An overview-
dc.typeArticle-
dc.identifier.wosid000249231700010-
dc.identifier.scopusid2-s2.0-34547487982-
dc.type.rimsART-
dc.citation.volume15-
dc.citation.issue10-
dc.citation.beginningpage1306-
dc.citation.endingpage1318-
dc.citation.publicationnameCONTROL ENGINEERING PRACTICE-
dc.identifier.doi10.1016/j.conengprac.2006.11.013-
dc.contributor.localauthorLee, JayHyung-
dc.contributor.nonIdAuthorLee, Kwang S.-
dc.type.journalArticleArticle; Proceedings Paper-
dc.subject.keywordAuthortracking control-
dc.subject.keywordAuthoriterative learning control-
dc.subject.keywordAuthormodel-based control-
dc.subject.keywordAuthorbatch process control-
dc.subject.keywordPlusMODEL-PREDICTIVE CONTROL-
dc.subject.keywordPlusWAFER TEMPERATURE UNIFORMITY-
dc.subject.keywordPlusREPETITIVE CONTROL-
dc.subject.keywordPlusSYSTEM-
dc.subject.keywordPlusCONVERGENCE-
dc.subject.keywordPlusALGORITHM-
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