Low voltage operating InGaZnO(4) thin film transistors using high-k MgO-Ba(0.6)Sr(0.4)TiO(3) composite gate dielectric on plastic substrate

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dc.contributor.authorKim, Dong-Hunko
dc.contributor.authorCho, Nam-Gyuko
dc.contributor.authorKim, Ho-Giko
dc.contributor.authorKim, Hyun-Sukko
dc.contributor.authorKim, Il-Dooko
dc.date.accessioned2013-03-08T08:02:25Z-
dc.date.available2013-03-08T08:02:25Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2008-07-
dc.identifier.citationAPPLIED PHYSICS LETTERS, v.93, no.3-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10203/92545-
dc.description.abstractThe authors report on the dielectric and leakage current properties of room temperature grown MgO-Ba(0.6)Sr(0.4)TiO(3) (MgO-BST) composite thin films to be utilized InGaZnO(4) thin films transistors (TFTs) fabricated on a polyethylene terephthalate (PET) substrate. The InGaZnO(4) TFTs with MgO-BST gate dielectrics exhibited low operation voltage of 4 V, high on/off current ratio of 4.13x10(6), and high field effect mobility of 10.86 cm(2)/V s. These results verify that a room temperature grown MgO-BST gate dielectric is a good candidate for producing high performance InGaZnO(4) TFTs on plastic substrates. (C) 2008 American Institute of Physics.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectAMORPHOUS OXIDE SEMICONDUCTORS-
dc.titleLow voltage operating InGaZnO(4) thin film transistors using high-k MgO-Ba(0.6)Sr(0.4)TiO(3) composite gate dielectric on plastic substrate-
dc.typeArticle-
dc.identifier.wosid000257968700057-
dc.identifier.scopusid2-s2.0-48249112642-
dc.type.rimsART-
dc.citation.volume93-
dc.citation.issue3-
dc.citation.publicationnameAPPLIED PHYSICS LETTERS-
dc.identifier.doi10.1063/1.2954014-
dc.contributor.localauthorKim, Ho-Gi-
dc.contributor.localauthorKim, Il-Doo-
dc.contributor.nonIdAuthorKim, Dong-Hun-
dc.contributor.nonIdAuthorKim, Hyun-Suk-
dc.type.journalArticleArticle-
dc.subject.keywordPlusAMORPHOUS OXIDE SEMICONDUCTORS-
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