DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chae, SH | ko |
dc.contributor.author | Seo, SH | ko |
dc.contributor.author | Chang, Hong-Young | ko |
dc.date.accessioned | 2013-03-08T00:49:07Z | - |
dc.date.available | 2013-03-08T00:49:07Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2006-02 | - |
dc.identifier.citation | CURRENT APPLIED PHYSICS, v.6, pp.235 - 238 | - |
dc.identifier.issn | 1567-1739 | - |
dc.identifier.uri | http://hdl.handle.net/10203/91641 | - |
dc.description.abstract | A new type plasma Source has been developed for the generation of low temperature plasma. The plasma generation process consists of two steps, the generation of metastable neutral gas by injecting a low energy electron beam (the thermionic Source) and the ionization of the metastable neutral gas by application of a UV light source. The key characteristic of this plasma source is the capability of producing extremely low temperature plasma. In the experiment, the filament heating current is 6.5 A and the electron acceleration voltage varies from 16 V to 25 V. Plasma parameters are measured by a single Langmuir probe. The plasma density increases 100% from 4.5 x 10(9) cm(-3) to 9.8 x 10(9) cm(-3) in Ar 30 mTorr when the neutrals excited by the e-beam are exposed to the UV light. However, the electron temperature is still low, i.e., similar to 0.5 eV. A similar result is observed in the case of Xe. (c) 2005 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.title | UV photon assist ionization for low temperature plasma | - |
dc.type | Article | - |
dc.identifier.wosid | 000234013800025 | - |
dc.identifier.scopusid | 2-s2.0-27744506314 | - |
dc.type.rims | ART | - |
dc.citation.volume | 6 | - |
dc.citation.beginningpage | 235 | - |
dc.citation.endingpage | 238 | - |
dc.citation.publicationname | CURRENT APPLIED PHYSICS | - |
dc.contributor.localauthor | Chang, Hong-Young | - |
dc.contributor.nonIdAuthor | Chae, SH | - |
dc.contributor.nonIdAuthor | Seo, SH | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordAuthor | e-beam plasma | - |
dc.subject.keywordAuthor | photon assist | - |
dc.subject.keywordAuthor | low electron temperature | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.