DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Dong Chan | ko |
dc.contributor.author | Kong, Bo Hyun | ko |
dc.contributor.author | Jun, Sang Ouk | ko |
dc.contributor.author | Cho, Hyung Koun | ko |
dc.contributor.author | Park, Dong Jun | ko |
dc.contributor.author | Lee, JeongYong | ko |
dc.date.accessioned | 2013-03-07T22:34:15Z | - |
dc.date.available | 2013-03-07T22:34:15Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2008-06 | - |
dc.identifier.citation | THIN SOLID FILMS, v.516, no.16, pp.5562 - 5566 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | http://hdl.handle.net/10203/91509 | - |
dc.description.abstract | ZnO thin films were grown at a reduced growth temperature on a Si substrate by low-pressure metalorganic chemical vapor deposition. The effects of the reactor pressures and the formation of micro-hillocks on the characteristics of the film were investigated. The ZnO films grown at 210 degrees C showed mass-transport limited growth behavior and a faceted surface morphology. It was found that the effect of the micro-hillocks on the structural, optical, and electrical properties can be ignored. While the sample grown at 10 Torr showed transparent conductive oxide properties, the sample gown at 3 Torr showed suitable characteristics for use as an ultraviolet emitter. (c) 2007 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | MOLECULAR-BEAM EPITAXY | - |
dc.subject | C-PLANE SAPPHIRE | - |
dc.subject | ELECTRICAL-PROPERTIES | - |
dc.subject | OPTICAL-PROPERTIES | - |
dc.subject | ROOM-TEMPERATURE | - |
dc.subject | LASERS | - |
dc.subject | LAYERS | - |
dc.title | Pressure dependence and micro-hillock formation of ZnO thin films grown at low temperature by MOCVD | - |
dc.type | Article | - |
dc.identifier.wosid | 000257452200084 | - |
dc.identifier.scopusid | 2-s2.0-43949087495 | - |
dc.type.rims | ART | - |
dc.citation.volume | 516 | - |
dc.citation.issue | 16 | - |
dc.citation.beginningpage | 5562 | - |
dc.citation.endingpage | 5566 | - |
dc.citation.publicationname | THIN SOLID FILMS | - |
dc.contributor.localauthor | Lee, JeongYong | - |
dc.contributor.nonIdAuthor | Kim, Dong Chan | - |
dc.contributor.nonIdAuthor | Kong, Bo Hyun | - |
dc.contributor.nonIdAuthor | Jun, Sang Ouk | - |
dc.contributor.nonIdAuthor | Cho, Hyung Koun | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordAuthor | ZnO | - |
dc.subject.keywordAuthor | MOCVD | - |
dc.subject.keywordAuthor | micro-hillock | - |
dc.subject.keywordAuthor | low temperature | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | MOLECULAR-BEAM EPITAXY | - |
dc.subject.keywordPlus | C-PLANE SAPPHIRE | - |
dc.subject.keywordPlus | ELECTRICAL-PROPERTIES | - |
dc.subject.keywordPlus | OPTICAL-PROPERTIES | - |
dc.subject.keywordPlus | ROOM-TEMPERATURE | - |
dc.subject.keywordPlus | LASERS | - |
dc.subject.keywordPlus | LAYERS | - |
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