DC Field | Value | Language |
---|---|---|
dc.contributor.author | Mai, L | ko |
dc.contributor.author | Song, H | ko |
dc.contributor.author | Tuan, LM | ko |
dc.contributor.author | Van Su, P | ko |
dc.contributor.author | Yoon, Giwan | ko |
dc.date.accessioned | 2013-03-07T19:10:22Z | - |
dc.date.available | 2013-03-07T19:10:22Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2005-12 | - |
dc.identifier.citation | MICROWAVE AND OPTICAL TECHNOLOGY LETTERS, v.47, pp.459 - 462 | - |
dc.identifier.issn | 0895-2477 | - |
dc.identifier.uri | http://hdl.handle.net/10203/91025 | - |
dc.description.abstract | This paper presents some methods to improve the resonance characteristics of film bulk acoustic-wave resonator (FBAR) devices. The FBAR devices were fabricated on Bragg reflectors. Thermal treatments were done using sintering and/or annealing processes. The measurement shows a considerable improvement of return loss (S-11) and quality factor (Q(8/p)). These thermal treatments seem very promising for enhancing the FBAR's resonance performance. (c) 2005 Wiley Periodicals, Inc. | - |
dc.language | English | - |
dc.publisher | JOHN WILEY & SONS INC | - |
dc.title | A comprehensive investigation of thermal treatment effects on resonance characteristics in FBAR devices | - |
dc.type | Article | - |
dc.identifier.wosid | 000232944000016 | - |
dc.identifier.scopusid | 2-s2.0-30544435514 | - |
dc.type.rims | ART | - |
dc.citation.volume | 47 | - |
dc.citation.beginningpage | 459 | - |
dc.citation.endingpage | 462 | - |
dc.citation.publicationname | MICROWAVE AND OPTICAL TECHNOLOGY LETTERS | - |
dc.identifier.doi | 10.1002/mop.21199 | - |
dc.contributor.localauthor | Yoon, Giwan | - |
dc.contributor.nonIdAuthor | Mai, L | - |
dc.contributor.nonIdAuthor | Song, H | - |
dc.contributor.nonIdAuthor | Tuan, LM | - |
dc.contributor.nonIdAuthor | Van Su, P | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | FBAR device | - |
dc.subject.keywordAuthor | Bragg reflector | - |
dc.subject.keywordAuthor | thermal annealing | - |
dc.subject.keywordAuthor | Q-factor | - |
dc.subject.keywordAuthor | return loss | - |
dc.subject.keywordAuthor | interfabrication annealing | - |
dc.subject.keywordAuthor | post-annealing | - |
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