Defect properties and p-type doping efficiency in phosphorus-doped ZnO

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dc.contributor.authorLee, Woo-Jinko
dc.contributor.authorJoon Goo, Kangko
dc.contributor.authorChang, Kee-Jooko
dc.date.accessioned2013-03-06T15:46:59Z-
dc.date.available2013-03-06T15:46:59Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2006-01-
dc.identifier.citationPHYSICAL REVIEW B, v.73, pp.024117 - 024117-
dc.identifier.issn1098-0121-
dc.identifier.urihttp://hdl.handle.net/10203/87479-
dc.description.abstractBased on first-principles pseudopotential calculations, we investigated the electronic structure of various P-related defects in ZnO and the p-type doping efficiency for two forms of P dopant sources such as P2O5 and Zn3P2. As compared to N dopants, a substitutional P at an O site has a higher ionization energy of about 0.62 eV, which makes it difficult to achieve p-type ZnO. Under Zn-rich growth conditions, P-O acceptors are compensated by dominant donors such as P-Zn, leading to n-type conduction. Although a P-Zn-2V(Zn) complex, which consists of a substitutional P at a Zn antisite and two Zn vacancies, acts as an acceptor, the formation of Zn vacancies is more probable on going to O-rich conditions for the dopant source using P2O5. On the other hand, when Zn3P2 is used as the P dopant source, the P-Zn-2V(Zn) complex is energetically more favorable and becomes the dominant acceptor under O-rich growth conditions.-
dc.languageEnglish-
dc.publisherAMERICAN PHYSICAL SOC-
dc.titleDefect properties and p-type doping efficiency in phosphorus-doped ZnO-
dc.typeArticle-
dc.identifier.wosid000235009300034-
dc.identifier.scopusid2-s2.0-33144467618-
dc.type.rimsART-
dc.citation.volume73-
dc.citation.beginningpage024117-
dc.citation.endingpage024117-
dc.citation.publicationnamePHYSICAL REVIEW B-
dc.identifier.doi10.1103/PhysRevB.73.024117-
dc.contributor.localauthorChang, Kee-Joo-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordPlusMOLECULAR-BEAM EPITAXY-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusROOM-TEMPERATURE-
dc.subject.keywordPlusELECTRON-GAS-
dc.subject.keywordPlusNITROGEN-
dc.subject.keywordPlus1ST-PRINCIPLES-
dc.subject.keywordPlusSEMICONDUCTORS-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusMGXZN1-XO-
dc.subject.keywordPlusSUBSTRATE-
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