DC Field | Value | Language |
---|---|---|
dc.contributor.author | 엄지용 | ko |
dc.contributor.author | 이병주 | ko |
dc.contributor.author | 남기석 | ko |
dc.contributor.author | 권식철 | ko |
dc.contributor.author | 권혁상 | ko |
dc.date.accessioned | 2013-03-06T04:51:34Z | - |
dc.date.available | 2013-03-06T04:51:34Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2001 | - |
dc.identifier.citation | 한국표면공학회지, v.34, no.3, pp.231 - 239 | - |
dc.identifier.issn | 1225-8024 | - |
dc.identifier.uri | http://hdl.handle.net/10203/85854 | - |
dc.description.abstract | The structure and composition of Cr-nitrides formed on an electroplated hard Cr layer during an ionnitriding process was analyzed, and the growth kinetics of the Cr-nitrides was examined as a function of the ion-nitriding temperature and time in order to establish a computer simulation model prediction the growth behavior of the Cr-nitride layer. The Cr-nitrides formed during the ion-nitriding at $550~770^{\circ}C$ were composed of outer CrN and inner $Cr_2$N layers. A nitrogen diffusion model in the multi-layer based on fixed grid FDM (Finite Difference Method) was applied to simulate the growth kinetics of Cr-nitride layers. By measuring the thickness of each Cr-nitride layer as a function of the ion-nitriding temperature and time, the activation energy for growth of each Cr-nitride was determined; 82.26 KJ/mol for CrN and 83.36 Kj/mol for $Cr_2$N. Further, the nitrogen diffusion constant was determined in each layer; $9.70$\times10-12</TEX> /㎡/s in CrN and $2.46$\times10-12</TEX> ㎡/s in $Cr_2$N. The simulation on the growth kinetics of Cr-nitride layers was in good agreements with the experimental results at 550~720℃. | - |
dc.language | English | - |
dc.publisher | 한국표면공학회 | - |
dc.title | 이온 질화에 의해 크롬 도금 층 위에 형성된 크롬 질화물의 성장에 관한 전산 모사 | - |
dc.title.alternative | Computer Simulation for the Growth of Cr-nitride Formed on Electrodeposited Cr during Ion-Nitriding | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.citation.volume | 34 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 231 | - |
dc.citation.endingpage | 239 | - |
dc.citation.publicationname | 한국표면공학회지 | - |
dc.contributor.localauthor | 권혁상 | - |
dc.contributor.nonIdAuthor | 엄지용 | - |
dc.contributor.nonIdAuthor | 이병주 | - |
dc.contributor.nonIdAuthor | 남기석 | - |
dc.contributor.nonIdAuthor | 권식철 | - |
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