Strain relaxation behavior of the InGaN/GaN multiple quantum wells observed by transmission electron microscopy

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We have investigated the strain relaxation behavior of InGaN/GaN multiple quantum wells (MQWs) with high indium composition using transmission electron microscopy (TEM). We found that the position of the main emission peak in the MQWs with indium content of more than the critical composition is significantly affected by the increase in the number of quantum wells (QWs). From high-resolution TEM (HRTEM) and energy dispersive X-ray spectroscopy (EDX), the redshift by the increase of QW numbers originates from the increase of indium segregation in the MQWs, and dislocations and stacking faults may enhance the formation of the indium segregation. (C) 2003 Elsevier B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE BV
Issue Date
2004-01
Language
English
Article Type
Article
Keywords

PHASE-SEPARATION; FILMS; PHOTOLUMINESCENCE; EPITAXY; DEVICES; GROWTH; ALLOYS; BLUE

Citation

APPLIED SURFACE SCIENCE, v.221, pp.288 - 292

ISSN
0169-4332
DOI
10.1016/S0169-4332(03)00884-5
URI
http://hdl.handle.net/10203/85780
Appears in Collection
MS-Journal Papers(저널논문)
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