Plasma parameters analysis of various mixed gas inductively coupled plasmas

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dc.contributor.authorBai, KHko
dc.contributor.authorYou, SJko
dc.contributor.authorChang, Hong-Youngko
dc.contributor.authorUhm, HSko
dc.date.accessioned2013-03-04T20:27:35Z-
dc.date.available2013-03-04T20:27:35Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2002-06-
dc.identifier.citationPHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838-
dc.identifier.issn1070-664X-
dc.identifier.urihttp://hdl.handle.net/10203/84017-
dc.description.abstractThe electron energy distribution functions and plasma parameters in various gas mixture discharges (N-2,O-2,CF4/He,Ar,Xe) are measured. When He is mixed, the electron temperature increases but the electron density is almost constant. The electron temperature increases rapidly near a He mixing ratio of 1, but it is almost constant when the mixing ratio is small. In Ar mixture discharge, the electron temperature is almost constant; the electron density increases rapidly near a mixing ratio of 1, but increases slightly when the mixing ratio is small. Mixing Xe increases the electron density and decreases the electron temperature. The electron density varies in a similar way with that of the Ar mixing case. A simple two-ion-species global model is used to analyze the plasma parameter variations as a function of mixing ratio, and it agrees well with the experimental results. (C) 2002 American Institute of Physics.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectCYCLOTRON-RESONANCE PLASMA-
dc.subjectTEMPERATURE CONTROL-
dc.subjectGRID SYSTEM-
dc.subjectDISCHARGE-
dc.subjectBIAS-
dc.titlePlasma parameters analysis of various mixed gas inductively coupled plasmas-
dc.typeArticle-
dc.identifier.wosid000175745400048-
dc.identifier.scopusid2-s2.0-0036607780-
dc.type.rimsART-
dc.citation.volume9-
dc.citation.issue6-
dc.citation.beginningpage2831-
dc.citation.endingpage2838-
dc.citation.publicationnamePHYSICS OF PLASMAS-
dc.contributor.localauthorChang, Hong-Young-
dc.contributor.nonIdAuthorBai, KH-
dc.contributor.nonIdAuthorYou, SJ-
dc.contributor.nonIdAuthorUhm, HS-
dc.type.journalArticleArticle-
dc.subject.keywordPlusCYCLOTRON-RESONANCE PLASMA-
dc.subject.keywordPlusTEMPERATURE CONTROL-
dc.subject.keywordPlusGRID SYSTEM-
dc.subject.keywordPlusDISCHARGE-
dc.subject.keywordPlusBIAS-
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