Near-UV emission from In-rich InGaN/GaN single quantum well structure with compositional grading

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We grew high quality In-rich InGaN/GaN single quantum well (SQW) structures by metal-organic chemical vapor deposition using growth interruption and obtained a sharp photoluminescence peak in near-ultraviolet (UV) region. During In-rich InGaN well layer growth, only TMIn and ammonia were supplied, however, atomic interdiffusion as well as defect generation occurred to relieve large lattice mismatch over 10% between InN and GaN. From medium-energy ion scattering measurement and subsequent fitting of the spectrum, we could find that the InGaN well layer was In-rich and it has 60-70% indium content. We also found the compositional grading of indium at top and bottom InGaN/GaN interfaces. The Fourier series method was used to calculate the energy levels and envelope functions in In-rich InGaN/GaN SQW with compositional grading and we could quantitatively explain the near-UV emission observed from the SQW.
Publisher
WILEY-V C H VERLAG GMBH
Issue Date
2004-09
Language
English
Article Type
Article; Proceedings Paper
Keywords

FUNDAMENTAL-BAND GAP; INDIUM NITRIDE; DIFFUSION; GROWTH; GE

Citation

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, v.201, pp.2818 - 2822

ISSN
0031-8965
DOI
10.1002/pssa.200405076
URI
http://hdl.handle.net/10203/83968
Appears in Collection
PH-Journal Papers(저널논문)
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