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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Journal Papers(저널논문)

Photobleaching photoacid generator

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dc.contributor.authorKim, Jin-Baekko
dc.contributor.authorJang, J.-H.ko
dc.contributor.authorKim, H.-W.ko
dc.contributor.authorWoo, S.-G.ko
dc.date.accessioned2013-03-04T18:07:51Z-
dc.date.available2013-03-04T18:07:51Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2001-
dc.identifier.citationJOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, v.14, no.3, pp.341 - 344-
dc.identifier.issn0914-9244-
dc.identifier.urihttp://hdl.handle.net/10203/83563-
dc.description.abstractA cyclopropyl group was introduced into the photoacid generator in order to give the photobleaching property at 193 nm. Cyclopropyldiphenylsulfonium trifluoromethanesulfonate (CpDP-Tf) was synthesized for this photobleaching effect. This compound is stable up to 165°C. The absorbance of CpDP-Tf at 193 nm decreases upon exposure. The resist containing CpDP-Tf gave the higher resolution comparing with that containing triphenyl-sulfonium trifluoromethanesulfonate.-
dc.languageJapanese-
dc.publisherTechnical Association of Photopolymers-
dc.titlePhotobleaching photoacid generator-
dc.typeArticle-
dc.identifier.scopusid2-s2.0-0035747315-
dc.type.rimsART-
dc.citation.volume14-
dc.citation.issue3-
dc.citation.beginningpage341-
dc.citation.endingpage344-
dc.citation.publicationnameJOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.nonIdAuthorJang, J.-H.-
dc.contributor.nonIdAuthorKim, H.-W.-
dc.contributor.nonIdAuthorWoo, S.-G.-
dc.subject.keywordAuthorArF excimer laser lithography-
dc.subject.keywordAuthorCyclopropyldiphenyl sulfonium trifluoromethane-sulfonate-
dc.subject.keywordAuthorPhotoacid generator-
dc.subject.keywordAuthorPhotobleaching-
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CH-Journal Papers(저널논문)
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