DC Field | Value | Language |
---|---|---|
dc.contributor.author | In, I | ko |
dc.contributor.author | Lee, H | ko |
dc.contributor.author | Fujigaya, T | ko |
dc.contributor.author | Okazaki, M | ko |
dc.contributor.author | Ueda, M | ko |
dc.contributor.author | Kim, Sang Youl | ko |
dc.date.accessioned | 2013-03-04T17:47:37Z | - |
dc.date.available | 2013-03-04T17:47:37Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-01 | - |
dc.identifier.citation | POLYMER BULLETIN, v.49, no.5, pp.349 - 355 | - |
dc.identifier.issn | 0170-0839 | - |
dc.identifier.uri | http://hdl.handle.net/10203/83509 | - |
dc.description.abstract | Hydroxy-terminated hyperbranched poly(arylene ether phosphine oxide) (P2) was synthesized via nucleophilic aromatic substitution reaction of AB(2) monomer, bis(4-hydroxyphenyl)-4'-fluorophenylphosphine oxide with K2CO3 as a base in NMP. The obtained polymer was dissolved well in NMP and DMSO, and casting of the solution gave a transparent film. The study on dissolution behavior of the film containing 10 wt% of diphenyliodonium-9,10-dimethoxyanthracene-2-sulfonate (DIAS) as a photoacid generator and 25 wt% of 4,4'-methylenebis-[2,6-bis(hydroxymethylphenyl) phenol] (MBHP) as a cross linker revealed that 0.5 wt% aqueous tetramthylammonium hydroxide (TMAH) solution was a suitable developer for this negative-type photoresist system. The photoresist system containing 10 wt% of DIAS and 25 wt% of MBHP showed the sensitivity of 9 mJ/cm(2) and the contrast of 1.6 when it was exposed to 365 nm light and postbaked at 120degreesC, followed by developing with 0.5 wt% aqueous TMAH solution at room temperature. The heat-treated (300degreesC, 30 min) negative image did not show any distortion. | - |
dc.language | English | - |
dc.publisher | SPRINGER | - |
dc.subject | POLYMERS | - |
dc.title | A new photoresist based on hyperbranched poly(arylene ether phosphine oxide) | - |
dc.type | Article | - |
dc.identifier.wosid | 000181367000007 | - |
dc.identifier.scopusid | 2-s2.0-0037287023 | - |
dc.type.rims | ART | - |
dc.citation.volume | 49 | - |
dc.citation.issue | 5 | - |
dc.citation.beginningpage | 349 | - |
dc.citation.endingpage | 355 | - |
dc.citation.publicationname | POLYMER BULLETIN | - |
dc.contributor.localauthor | Kim, Sang Youl | - |
dc.contributor.nonIdAuthor | In, I | - |
dc.contributor.nonIdAuthor | Lee, H | - |
dc.contributor.nonIdAuthor | Fujigaya, T | - |
dc.contributor.nonIdAuthor | Okazaki, M | - |
dc.contributor.nonIdAuthor | Ueda, M | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | POLYMERS | - |
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