펨토초 레이저를 이용한 극미세 광조형 기반공정 개발Fundamental Process Development of a Ultramicro-Stereolithography using a Femto-second Laser for Manufacturing Nano-scaled Features

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dc.contributor.author박상후ko
dc.contributor.author임태우ko
dc.contributor.author정창균ko
dc.contributor.author양동열ko
dc.contributor.author이신욱ko
dc.contributor.author이성구ko
dc.contributor.author공홍진ko
dc.date.accessioned2013-03-04T14:58:17Z-
dc.date.available2013-03-04T14:58:17Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2004-03-
dc.identifier.citation한국정밀공학회지, v.21, no.3, pp.180 - 187-
dc.identifier.issn1225-9071-
dc.identifier.urihttp://hdl.handle.net/10203/83006-
dc.description.abstractThe miniaturization technologies are perceived as potential key technologies of the future. They will bring about completely different ways in which people and machines interact with the physical world. However, at the present time, the primary technologies used fur miniaturization are dependent on the microelectronic fabrication techniques. The principal shortcomings associated with such techniques are related to the inability of to produce arbitrary three-dimensional features not only in electronics but also in a wide range of metallic materials. In this paper, a ultramicro-stereolithography system assisted with a femto-second laser was developed to fabricate the arbitrary three-dimensional nano/micro-scaled features. In the developed process, a femto-second laser is projected according to CAD data on a photosensitive monomer resin, it induces polymerization of the liquid resin. After the polymerization, a droplet of ethanol is dropped to remove the liquid resin and then the polymerized nano-scaled features only remain. By a newly developed process, miniature devices for an extremely wide range of applications would become a technologically feasible reality. Some of nano/micro-scaled features as examples were fabricated to prove the usefulness of this study at the fundamental stage.-
dc.languageKorean-
dc.publisher한국정밀공학회-
dc.title펨토초 레이저를 이용한 극미세 광조형 기반공정 개발-
dc.title.alternativeFundamental Process Development of a Ultramicro-Stereolithography using a Femto-second Laser for Manufacturing Nano-scaled Features-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume21-
dc.citation.issue3-
dc.citation.beginningpage180-
dc.citation.endingpage187-
dc.citation.publicationname한국정밀공학회지-
dc.identifier.kciidART001098009-
dc.contributor.localauthor양동열-
dc.contributor.nonIdAuthor박상후-
dc.contributor.nonIdAuthor임태우-
dc.contributor.nonIdAuthor정창균-
dc.contributor.nonIdAuthor이신욱-
dc.contributor.nonIdAuthor이성구-
dc.contributor.nonIdAuthor공홍진-
dc.description.isOpenAccessN-
dc.subject.keywordAuthorUltramicro-Stereolithography(극미세 광조형법)-
dc.subject.keywordAuthorFemto-second Laser(펨토초 레이저)-
dc.subject.keywordAuthorTwo-photon Polymerization(이광자흡수 경화)-
dc.subject.keywordAuthorNano-scaled Features(나노 정밀도 형상)-
dc.subject.keywordAuthorUltramicro-Stereolithography(극미세 광조형법)-
dc.subject.keywordAuthorFemto-second Laser(펨토초 레이저)-
dc.subject.keywordAuthorTwo-photon Polymerization(이광자흡수 경화)-
dc.subject.keywordAuthorNano-scaled Features(나노 정밀도 형상)-
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ME-Journal Papers(저널논문)
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