RF-Sputtered Vanadium Oxide Thin Films : Effect of OxygenPartial Pressure on Structural and Electrochemical Properties
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박신종 | ko |
| dc.date.accessioned | 2013-03-04T08:52:57Z | - |
| dc.date.available | 2013-03-04T08:52:57Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2001-09 | - |
| dc.identifier.citation | BULLETIN OF THE KOREAN CHEMICAL SOCIETY, v.22, no.9, pp.1015 - 1018 | - |
| dc.identifier.issn | 0253-2964 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/82238 | - |
| dc.language | Korean | - |
| dc.publisher | 대한화학회 | - |
| dc.title | RF-Sputtered Vanadium Oxide Thin Films : Effect of OxygenPartial Pressure on Structural and Electrochemical Properties | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 22 | - |
| dc.citation.issue | 9 | - |
| dc.citation.beginningpage | 1015 | - |
| dc.citation.endingpage | 1018 | - |
| dc.citation.publicationname | BULLETIN OF THE KOREAN CHEMICAL SOCIETY | - |
| dc.contributor.localauthor | 박신종 | - |
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