DC Field | Value | Language |
---|---|---|
dc.contributor.author | Choi, YS | ko |
dc.contributor.author | Yoon, Jun-Bo | ko |
dc.date.accessioned | 2013-03-04T07:51:45Z | - |
dc.date.available | 2013-03-04T07:51:45Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2004-02 | - |
dc.identifier.citation | IEEE ELECTRON DEVICE LETTERS, v.25, no.2, pp.76 - 79 | - |
dc.identifier.issn | 0741-3106 | - |
dc.identifier.uri | http://hdl.handle.net/10203/82067 | - |
dc.description.abstract | The effect of metal thickness on the quality (Q-) factor of the integrated spiral inductor is investigated in this paper. The inductors with metal thicknesses of 5 similar to 22.5 mum were fabricated on the standard silicon substrate of 1 similar to 30 Omega (.) cm in resistivity by using thick-metal surface micromachining technology. The fabricated inductors were measured at GHz ranges to extract their major parameters (Q-factor, inductance, and resistance). From the experimental analysis assisted by FEM simulation, we first reported that the metal thickness' effect on the Q-factor strongly depends on the innermost turn diameter of the spiral inductor, so that it is possible to improve Q-factors further by increasing the metal thickness beyond 10 mum. | - |
dc.language | English | - |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.subject | SILICON | - |
dc.subject | DESIGN | - |
dc.title | Experimental analysis of the effect of metal thickness on the quality factor in integrated spiral inductors for RF ICs | - |
dc.type | Article | - |
dc.identifier.wosid | 000188807300010 | - |
dc.identifier.scopusid | 2-s2.0-1342286928 | - |
dc.type.rims | ART | - |
dc.citation.volume | 25 | - |
dc.citation.issue | 2 | - |
dc.citation.beginningpage | 76 | - |
dc.citation.endingpage | 79 | - |
dc.citation.publicationname | IEEE ELECTRON DEVICE LETTERS | - |
dc.identifier.doi | 10.1109/LED.2003.822652 | - |
dc.contributor.localauthor | Yoon, Jun-Bo | - |
dc.contributor.nonIdAuthor | Choi, YS | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | integrated micromachined inductor | - |
dc.subject.keywordAuthor | metal thickness | - |
dc.subject.keywordAuthor | micromachining | - |
dc.subject.keywordAuthor | Q-factor | - |
dc.subject.keywordAuthor | radio frequency (RF) ICs | - |
dc.subject.keywordAuthor | resistance | - |
dc.subject.keywordAuthor | RF MEMS | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | DESIGN | - |
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