DC Field | Value | Language |
---|---|---|
dc.contributor.author | Pyun, Su Il | ko |
dc.contributor.author | Na, KH | ko |
dc.contributor.author | Park, JJ | ko |
dc.date.accessioned | 2013-03-03T23:09:24Z | - |
dc.date.available | 2013-03-03T23:09:24Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2001-10 | - |
dc.identifier.citation | JOURNAL OF SOLID STATE ELECTROCHEMISTRY, v.5, no.7-8, pp.473 - 478 | - |
dc.identifier.issn | 1432-8488 | - |
dc.identifier.uri | http://hdl.handle.net/10203/80856 | - |
dc.description.abstract | The mechanism of pit growth of pure aluminum (Al) in sulfate ion (SO42-)- or nitrate ion (NO3-)-containing 0.1 M sodium chloride solutions has been studied in terms of the morphological changes of artificial pits using potentiodynamic polarization experiment, potentiostatic current transient technique and optical microscopy. The increase in SO42- and NO3- ion concentrations in NaCl solution raised the pitting potential E-pit of pure Al, which is ascribed to the impediment to pit initiation on pure Al by the addition of SO42- or NO3- ions. From the potentiostatic. current transients of artificial pits in aqueous 0.1 M NaCl solution, the average value of the pit current was observed to increase with increasing SO42- ion concentration, whereas that value of the pit current in the presence of NO3- ions increased up to ca. 0.4 M NO3- ion concentration and then decreased abruptly with increasing NO3- ion concentration. From observations of the morphologies of the pits, it appears that the pit grows preferentially in the lateral direction or in the downward direction by adding SO42- or NO3- ions to aqueous 0.1 M NaCl solution, respectively. Based upon the experimental results, two different pit growth mechanisms by anion additives can be proposed: (1) pit growth by the preferential attack of both SO42- and Cl- to the pit wall in SO42--containing solutions; (2) pit growth by the creation of an aggressive environment at the pit bottom up to 0.4 M NO3- ion concentration due to the lower mobility of NO3- than Cl- in NO3--containing solutions. | - |
dc.language | English | - |
dc.publisher | SPRINGER-VERLAG | - |
dc.subject | SINGLE CORROSION PITS | - |
dc.subject | CHLORIDE SOLUTION | - |
dc.subject | PITTING CORROSION | - |
dc.subject | STAINLESS-STEEL | - |
dc.subject | INHIBITION | - |
dc.subject | REPASSIVATION | - |
dc.subject | ADSORPTION | - |
dc.subject | ADDITIVES | - |
dc.subject | ANIONS | - |
dc.title | Morphological studies of the mechanism of pit growth of pure aluminum in sulfate ion- or nitrate ion-containing 0.1 M NaCl solutions | - |
dc.type | Article | - |
dc.identifier.wosid | 000171816300005 | - |
dc.type.rims | ART | - |
dc.citation.volume | 5 | - |
dc.citation.issue | 7-8 | - |
dc.citation.beginningpage | 473 | - |
dc.citation.endingpage | 478 | - |
dc.citation.publicationname | JOURNAL OF SOLID STATE ELECTROCHEMISTRY | - |
dc.contributor.nonIdAuthor | Na, KH | - |
dc.contributor.nonIdAuthor | Park, JJ | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordAuthor | aluminum | - |
dc.subject.keywordAuthor | sulfate ion | - |
dc.subject.keywordAuthor | nitrate ion | - |
dc.subject.keywordAuthor | artificial pit | - |
dc.subject.keywordAuthor | pit growth | - |
dc.subject.keywordPlus | SINGLE CORROSION PITS | - |
dc.subject.keywordPlus | CHLORIDE SOLUTION | - |
dc.subject.keywordPlus | PITTING CORROSION | - |
dc.subject.keywordPlus | STAINLESS-STEEL | - |
dc.subject.keywordPlus | INHIBITION | - |
dc.subject.keywordPlus | REPASSIVATION | - |
dc.subject.keywordPlus | ADSORPTION | - |
dc.subject.keywordPlus | ADDITIVES | - |
dc.subject.keywordPlus | ANIONS | - |
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