복셀 차감법에 의한 나노 복화(複畵)공정 정밀화Development of Contour Offset Algorithm(COA) in nRP Process for Fabricating Nano-precision Features

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dc.contributor.author임태우ko
dc.contributor.author박상후ko
dc.contributor.author양동열ko
dc.contributor.author이신욱ko
dc.date.accessioned2013-03-03T21:57:15Z-
dc.date.available2013-03-03T21:57:15Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2004-06-
dc.identifier.citation한국정밀공학회지, v.21, no.6, pp.160 - 166-
dc.identifier.issn1225-9071-
dc.identifier.urihttp://hdl.handle.net/10203/80616-
dc.description.abstractIn this study, a new algorithm, named as Contour Offset Algorithm(COA) is developed to fabricate precise features or patterns in the range of several micrometers by nano replication printing(nRP) process. In the nRP process, a femto-second laser is scanned on a photosensitive monomer resin in order to induce polymerization of the liquid monomer according to a voxel matrix which is transformed from the bitmap format file. After polymerization, a droplet of ethanol is dropped to remove the unnecessary remaining liquid resin and then only the polymerized figures with nano-scaled precision are remaining on the glass plate. To obtain more precise replicated features, the contour lines in voxel matrix should be modified considering a voxel size. In this study, the efficiency of the proposed method is shown through two examples in view of accuracy.-
dc.languageKorean-
dc.publisher한국정밀공학회-
dc.title복셀 차감법에 의한 나노 복화(複畵)공정 정밀화-
dc.title.alternativeDevelopment of Contour Offset Algorithm(COA) in nRP Process for Fabricating Nano-precision Features-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume21-
dc.citation.issue6-
dc.citation.beginningpage160-
dc.citation.endingpage166-
dc.citation.publicationname한국정밀공학회지-
dc.contributor.localauthor양동열-
dc.contributor.nonIdAuthor임태우-
dc.contributor.nonIdAuthor박상후-
dc.contributor.nonIdAuthor이신욱-
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