DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Sung Kwan | ko |
dc.contributor.author | Kim, Yangsoo | ko |
dc.contributor.author | No, Kwangsoo | ko |
dc.date.accessioned | 2008-11-19T02:08:49Z | - |
dc.date.available | 2008-11-19T02:08:49Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2006-09 | - |
dc.identifier.citation | X-RAY SPECTROMETRY, v.35, no.5, pp.287 - 295 | - |
dc.identifier.issn | 0049-8246 | - |
dc.identifier.uri | http://hdl.handle.net/10203/7863 | - |
dc.description.abstract | The local structures of Hf-O-N thin films were analyzed using an extended x-ray absorption fine structure (EXAFS) study of the Hf L-3-edge and first-principles calculations. Depending on their composition and atomic configurations, Hf4O5N2 [coordination number (CN): 6.25], Hf4O2N4 (CN: 5.5) and Hf4O2N4 (CN: 5.0) were suggested as the local structures of Hf-O-N thin films. Using the suggested local structures, the electronic structures of Hf-O-N thin films were calculated. The variations of the valence band were analyzed with the film composition and compared with the experimental valence band. The optical band gaps of Hf-O-N thin films were compared with the calculated values. The transition rate for the optical absorption was suggested as another reason for the band gap difference. Copyright (c) 2006 John Wiley & Sons, Ltd. | - |
dc.description.sponsorship | MOST and Pohang Iron and Steel (POSCO) Isao Tanaka for supporting the ab initiototal energy and molecular dynamics program VASP (Vienna ab initio simulation package). | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | JOHN WILEY SONS LTD | - |
dc.subject | OXYNITRIDE | - |
dc.subject | OXIDE | - |
dc.title | Local structures and electronic structures of Hf-O-N thin films: x-ray absorption fine structure study and first-principles calculations | - |
dc.type | Article | - |
dc.identifier.wosid | 000241001800006 | - |
dc.identifier.scopusid | 2-s2.0-33749384524 | - |
dc.type.rims | ART | - |
dc.citation.volume | 35 | - |
dc.citation.issue | 5 | - |
dc.citation.beginningpage | 287 | - |
dc.citation.endingpage | 295 | - |
dc.citation.publicationname | X-RAY SPECTROMETRY | - |
dc.identifier.doi | 10.1002/xrs.909 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | No, Kwangsoo | - |
dc.contributor.nonIdAuthor | Kim, Sung Kwan | - |
dc.contributor.nonIdAuthor | Kim, Yangsoo | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | OXYNITRIDE | - |
dc.subject.keywordPlus | OXIDE | - |
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