Nanocrystals acting as Coulomb islands operating at room temperature created using a focused ion-beam process

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dc.contributor.authorKim, TWko
dc.contributor.authorChoo, DCko
dc.contributor.authorShim, JHko
dc.contributor.authorJung, Mko
dc.contributor.authorKang, SOko
dc.contributor.authorLee, HSko
dc.contributor.authorLee, JeongYongko
dc.date.accessioned2013-03-03T10:11:05Z-
dc.date.available2013-03-03T10:11:05Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2001-07-
dc.identifier.citationAPPLIED PHYSICS LETTERS, v.79, no.1, pp.120 - 122-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10203/78327-
dc.description.abstractA Ga+ focused ion-beam (FIB) technique utilizing both lithographic and nanoparticle formation processes has been introduced to create nanocrystals acting as Coulomb islands at room temperature. High-resolution transmission electron microscopy results show that the nanocrystals acting as Coulomb islands are created in the source-drain active layer by using a Ga+ FIB. The results for the drain current and the conductance as functions of the drain voltage with an open gate voltage at room temperature show a Coulomb staircase and conductance oscillations, respectively. Nanoscale particles of Al with an amorphous phase are created in the source-drain channel by the defects due to the radiation effect of the Ga+ FIB, and collisions between Ga+ ions and Al atoms produce secondary electrons, that interact with the nanoparticles, which are acting as Coulomb islands, to form the crystal phase. (C) 2001 American Institute of Physics.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectSINGLE-ELECTRON TRANSISTORS-
dc.subjectQUANTUM-DOT TRANSISTORS-
dc.subjectSILICON-
dc.subjectBLOCKADE-
dc.subjectSTATES-
dc.subjectMEMORY-
dc.subjectGATE-
dc.subjectNANOPARTICLES-
dc.subjectMICROSCOPY-
dc.subjectSUBSTRATE-
dc.titleNanocrystals acting as Coulomb islands operating at room temperature created using a focused ion-beam process-
dc.typeArticle-
dc.identifier.wosid000169658800041-
dc.identifier.scopusid2-s2.0-0035796662-
dc.type.rimsART-
dc.citation.volume79-
dc.citation.issue1-
dc.citation.beginningpage120-
dc.citation.endingpage122-
dc.citation.publicationnameAPPLIED PHYSICS LETTERS-
dc.identifier.doi10.1063/1.1378052-
dc.contributor.localauthorLee, JeongYong-
dc.contributor.nonIdAuthorKim, TW-
dc.contributor.nonIdAuthorChoo, DC-
dc.contributor.nonIdAuthorShim, JH-
dc.contributor.nonIdAuthorJung, M-
dc.contributor.nonIdAuthorKang, SO-
dc.contributor.nonIdAuthorLee, HS-
dc.type.journalArticleArticle-
dc.subject.keywordPlusSINGLE-ELECTRON TRANSISTORS-
dc.subject.keywordPlusQUANTUM-DOT TRANSISTORS-
dc.subject.keywordPlusSILICON-
dc.subject.keywordPlusBLOCKADE-
dc.subject.keywordPlusSTATES-
dc.subject.keywordPlusMEMORY-
dc.subject.keywordPlusGATE-
dc.subject.keywordPlusNANOPARTICLES-
dc.subject.keywordPlusMICROSCOPY-
dc.subject.keywordPlusSUBSTRATE-
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