DC Field | Value | Language |
---|---|---|
dc.contributor.author | Cha, SY | ko |
dc.contributor.author | Jang, BT | ko |
dc.contributor.author | Kwak, DH | ko |
dc.contributor.author | Shin, CH | ko |
dc.contributor.author | Lee, Hee Chul | ko |
dc.date.accessioned | 2013-03-03T05:38:48Z | - |
dc.date.available | 2013-03-03T05:38:48Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1997 | - |
dc.identifier.citation | INTEGRATED FERROELECTRICS, v.17, no.1-4, pp.187 - 195 | - |
dc.identifier.issn | 1058-4587 | - |
dc.identifier.uri | http://hdl.handle.net/10203/77467 | - |
dc.description.abstract | We propose Ir thin films as new electrode materials for high dielectric BST capacitors. Ir was found to be superior to Pt in a number of aspects such as resistivity, adhesion and surface roughness. The Pt/BST/Ir/SiO2/Si capacitors showed leakage currents as low as Pt/PST/Pt/SiO2/Si ones, but higher capacitance resulted. For endurance properties with +5V unipolar pulse trains, the dielectric constant of BST films on Ir decreased by only 10% below its initial value after switching of 10(9) cycles while that on Pt degraded by 30% after 10(8) cycles. Ir bottom electrode effects on BST film properties were well explained by the formation of IrO2 phases on the surface of Ir electrodes. | - |
dc.language | English | - |
dc.publisher | GORDON BREACH SCI PUBL LTD | - |
dc.subject | PT/TI | - |
dc.title | Iridium thin film as a bottom electrode for high dielectric (Ba,Sr)TiO3 capacitors | - |
dc.type | Article | - |
dc.identifier.wosid | A1997YF22200019 | - |
dc.identifier.scopusid | 2-s2.0-0031362139 | - |
dc.type.rims | ART | - |
dc.citation.volume | 17 | - |
dc.citation.issue | 1-4 | - |
dc.citation.beginningpage | 187 | - |
dc.citation.endingpage | 195 | - |
dc.citation.publicationname | INTEGRATED FERROELECTRICS | - |
dc.contributor.localauthor | Lee, Hee Chul | - |
dc.contributor.nonIdAuthor | Cha, SY | - |
dc.contributor.nonIdAuthor | Jang, BT | - |
dc.contributor.nonIdAuthor | Kwak, DH | - |
dc.contributor.nonIdAuthor | Shin, CH | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordAuthor | iridium | - |
dc.subject.keywordAuthor | bottom electrode | - |
dc.subject.keywordAuthor | high dielectric thin film | - |
dc.subject.keywordPlus | PT/TI | - |
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