Measurement of thermal conductivities of SiN and TbFeCo films

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dc.contributor.authorKim, SSko
dc.contributor.authorAhn, YMko
dc.contributor.authorLee, KGko
dc.contributor.authorGill, BLko
dc.contributor.authorShin, Sung-Chulko
dc.date.accessioned2013-03-02T23:56:10Z-
dc.date.available2013-03-02T23:56:10Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1996-09-
dc.identifier.citationIEEE TRANSACTIONS ON MAGNETICS, v.32, no.5, pp.4095 - 1-
dc.identifier.issn0018-9464-
dc.identifier.urihttp://hdl.handle.net/10203/76122-
dc.description.abstractThe effective thermal conductivities of SiN and TbFeCo thin films were measured by comparing the length and width of polarizing microscope image of thermo-magnetically written domains with those of calculated isotherms for the trilayer structure of substrate/Si3N4/Tb22Fe70C08/Si3N4. The resulting data were applied to the quadrillayer structure of substrate/Si3N4/Tb22Fe70C08/Si3N4/Al, and the length of calculated isotherms was turned out to agree with that of written domain.-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.titleMeasurement of thermal conductivities of SiN and TbFeCo films-
dc.typeArticle-
dc.identifier.wosidA1996VM25800237-
dc.identifier.scopusid2-s2.0-0030245031-
dc.type.rimsART-
dc.citation.volume32-
dc.citation.issue5-
dc.citation.beginningpage4095-
dc.citation.endingpage1-
dc.citation.publicationnameIEEE TRANSACTIONS ON MAGNETICS-
dc.contributor.localauthorShin, Sung-Chul-
dc.contributor.nonIdAuthorKim, SS-
dc.contributor.nonIdAuthorAhn, YM-
dc.contributor.nonIdAuthorLee, KG-
dc.contributor.nonIdAuthorGill, BL-
dc.type.journalArticleArticle; Proceedings Paper-
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