DC Field | Value | Language |
---|---|---|
dc.contributor.author | Myong, SY | ko |
dc.contributor.author | Kim, SS | ko |
dc.contributor.author | Lim, Koeng Su | ko |
dc.date.accessioned | 2007-07-02T06:21:49Z | - |
dc.date.available | 2007-07-02T06:21:49Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2004-06 | - |
dc.identifier.citation | APPLIED PHYSICS LETTERS, v.84, pp.5416 - 5418 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | http://hdl.handle.net/10203/755 | - |
dc.description.abstract | We proposed an in situ postdeposition ultraviolet treatment in an Ar ambient (UTA) to improve the p/i interface of amorphous silicon based solar cell. We have increased the conversion efficiency by similar to16% by improving the built-in potential and reducing recombination at the p/i interface. Through spectroscopic ellipsometry and Fourier-transform infrared measurements, it is concluded that the UTA process induces structural modification of the p-type hydrogenated amorphous silicon-carbide (p-a-SiC:H) window layer. An ultrathin p-a-SiC:H contamination layer formed during the UTA process acts as a buffer layer at the interface. (C) 2004 American Institute of Physics. | - |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | VAPOR-DEPOSITION | - |
dc.subject | PLASMA | - |
dc.subject | FILMS | - |
dc.subject | DILUTION | - |
dc.subject | LAYER | - |
dc.title | In situ ultraviolet treatment in an Ar ambient upon p-type hydrogenated amorphous silicon-carbide windows of hydrogenated amorphous silicon based solar cells | - |
dc.type | Article | - |
dc.identifier.wosid | 000222200600040 | - |
dc.identifier.scopusid | 2-s2.0-3242721527 | - |
dc.type.rims | ART | - |
dc.citation.volume | 84 | - |
dc.citation.beginningpage | 5416 | - |
dc.citation.endingpage | 5418 | - |
dc.citation.publicationname | APPLIED PHYSICS LETTERS | - |
dc.identifier.doi | 10.1063/1.1767601 | - |
dc.contributor.localauthor | Lim, Koeng Su | - |
dc.contributor.nonIdAuthor | Myong, SY | - |
dc.contributor.nonIdAuthor | Kim, SS | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | PLASMA | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordPlus | DILUTION | - |
dc.subject.keywordPlus | LAYER | - |
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