Thick photosensitive inorganic-organic hybrid gel films are fabricated using a silica-PEO(poly(ethylene oxide)) polymeric network and several chelated metal alkoxides: Ti(OEt)(4), Al(OBusec)(3), Zr(OPrn)(4). The gamma -glycidoxypropyltrimethoxysilane (GPTS) and the metal alkoxides stabilized by beta -ketoester or beta -diketone are used as precursors. The chelated metal complex in the gel films are photodecomposed and forms the oxide network by UV exposure. The photodecomposition of the chelate ring and the photobleaching of the UV absorption bands are investigated as a function of UV exposure time. The photobleaching rates with respect to chelating agents, metal alkoxides and photon energy are compared.