Single-layer halftone phase-shifting masks for DUV microlithography: Optical property simulation and chromium compound film preparation
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Jiang, ZT | ko |
| dc.contributor.author | Hong, Daniel Seungbum | ko |
| dc.contributor.author | Kim, E | ko |
| dc.contributor.author | Bae, Byeong-Soo | ko |
| dc.contributor.author | Lim, S | ko |
| dc.contributor.author | Woo, SG | ko |
| dc.contributor.author | Koh, YB | ko |
| dc.contributor.author | No, Kwangsoo | ko |
| dc.date.accessioned | 2013-03-02T17:02:44Z | - |
| dc.date.available | 2013-03-02T17:02:44Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1997-04 | - |
| dc.identifier.citation | APPLIED SURFACE SCIENCE, v.113, pp.680 - 684 | - |
| dc.identifier.issn | 0169-4332 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/74593 | - |
| dc.description.abstract | The investigation of single layer halftone. phase shift mask (SLHTPSM) has been carried by both simulation and chromium fluoride film fabrication. Theoretical analysis provides the optimum SLHTPSM constructions for I-line (365 nm), KrF (248 nm) and Aff (193 nm) microlithographies. A fully characterization of chromium fluoride film processed by de magnetron sputtering shows a feasibility of using this film in the fabricating DUV-PSM. | - |
| dc.language | English | - |
| dc.publisher | ELSEVIER SCIENCE BV | - |
| dc.title | Single-layer halftone phase-shifting masks for DUV microlithography: Optical property simulation and chromium compound film preparation | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1997WW85000133 | - |
| dc.identifier.scopusid | 2-s2.0-0031547182 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 113 | - |
| dc.citation.beginningpage | 680 | - |
| dc.citation.endingpage | 684 | - |
| dc.citation.publicationname | APPLIED SURFACE SCIENCE | - |
| dc.identifier.doi | 10.1016/S0169-4332(96)00933-6 | - |
| dc.contributor.localauthor | Hong, Daniel Seungbum | - |
| dc.contributor.localauthor | Bae, Byeong-Soo | - |
| dc.contributor.localauthor | No, Kwangsoo | - |
| dc.contributor.nonIdAuthor | Jiang, ZT | - |
| dc.contributor.nonIdAuthor | Kim, E | - |
| dc.contributor.nonIdAuthor | Lim, S | - |
| dc.contributor.nonIdAuthor | Woo, SG | - |
| dc.contributor.nonIdAuthor | Koh, YB | - |
| dc.description.isOpenAccess | N | - |
| dc.type.journalArticle | Article; Proceedings Paper | - |
| dc.subject.keywordAuthor | DUV-lithography | - |
| dc.subject.keywordAuthor | simulation | - |
| dc.subject.keywordAuthor | phase-shifting mask | - |
| dc.subject.keywordAuthor | CrF film | - |
| dc.subject.keywordAuthor | Dc sputtering | - |
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