An electron microscopy study on the formation mechanism of hillocks on the (100)CdTe/GaAs

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An electron microscopy study has been performed on the microstructure of (1 0 0)CdTe epitaxial layers, which were grown upon a 4 degrees-off (1 0 0)GaAs substrate by metalorganic chemical vapor deposition. The surface of the epitaxial layer is covered with a large number of elongated pyramidal hillocks along the [0 1 (1) over bar] direction. Their surface density is about 7 x 10(6)/cm(2) and they have various sizes within 2.5 mu m x 6.5 mu m. The hillocks are built up by the propagation of planar defects. Growth-mediated planar defects are responsible for the formation of elongated pyramidal hillocks in relation to the anisotropic distribution of planar defects: planar defects propagated by the growth mechanism are found particularly along the [0 1 (1) over bar] direction. In addition, because the generation of growth-mediated planar defects through deposition errors occurs at any place as well as on substrate surface irregularities, hillocks can have various sizes, (C) 1998 Published by Elsevier Science B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE BV
Issue Date
1998-08
Language
English
Article Type
Article
Keywords

MOLECULAR-BEAM EPITAXY; VAPOR-PHASE EPITAXY; GAAS; CDTE; SEMICONDUCTORS; DISLOCATIONS; EPILAYERS; LAYERS; MOVPE

Citation

JOURNAL OF CRYSTAL GROWTH, v.192, no.1-2, pp.109 - 116

ISSN
0022-0248
URI
http://hdl.handle.net/10203/74459
Appears in Collection
MS-Journal Papers(저널논문)
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