DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Jin-Baek | ko |
dc.contributor.author | Kim, H | ko |
dc.contributor.author | Choi, JH | ko |
dc.date.accessioned | 2013-02-28T06:59:21Z | - |
dc.date.available | 2013-02-28T06:59:21Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1999-03 | - |
dc.identifier.citation | POLYMER, v.40, no.6, pp.1617 - 1621 | - |
dc.identifier.issn | 0032-3861 | - |
dc.identifier.uri | http://hdl.handle.net/10203/73380 | - |
dc.description.abstract | Poly(2-trimethyisilyl-2-propyl methacrylate) was synthesized and evaluated as a potential dry-developable chemically amplified photoresist. The deprotection of 2-trimethyllsilyl-2-propyl group of the polymer takes place in the exposed region after post-exposure bake. The difference of silicon content between the unexposed region and exposed regions is large enough to form patterns using oxygen reactive-ion etching. The etching selectivity of the unexposed region to the exposed region was 142. (C) 1998 Elsevier Science Ltd All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCI LTD | - |
dc.subject | RESIST | - |
dc.title | Synthesis of poly(2-trimethylsilyl-2-propyl methacrylate) and their application as a dry-developable chemically amplified photoresist | - |
dc.type | Article | - |
dc.identifier.wosid | 000077442200033 | - |
dc.identifier.scopusid | 2-s2.0-0033102143 | - |
dc.type.rims | ART | - |
dc.citation.volume | 40 | - |
dc.citation.issue | 6 | - |
dc.citation.beginningpage | 1617 | - |
dc.citation.endingpage | 1621 | - |
dc.citation.publicationname | POLYMER | - |
dc.identifier.doi | 10.1016/S0032-3861(98)00411-X | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Kim, H | - |
dc.contributor.nonIdAuthor | Choi, JH | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | dry-developable resist | - |
dc.subject.keywordAuthor | chemically amplified resist | - |
dc.subject.keywordAuthor | silicon containing polymer | - |
dc.subject.keywordPlus | RESIST | - |
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